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Remote Plasma System - Chamber
Details
Designed to eliminate powder or metal-based byproducts within process chambers and pumps, extending MTBF and reducing PM cycles.
- Utilizes remote plasma technology to generate F*(radicals)for byproduct removal
■ Technical Specifications
- RF Power System : Max 10kW
■ Applicable Processes
- Metal : W, WN, TiN
- CVD : SiO2 (TEOS), ACL, Mold
- Diff : EPI process